Yoon Moohyun | Pohang Accelerator Laboratory Pohang University Of Science And Technology (postech)
スポンサーリンク
概要
Pohang Accelerator Laboratory Pohang University Of Science And Technology (postech) | 論文
- Degradation Phenomenon of p+to p+ Isolation Characteristics Caused by Carrier Injection in a High-Voltage Process
- Process Design for Preventing the Gate Oxide Thinning in the Integration of Dual Gate Oxide Transistor
- New STI Scheme to Compensate Gate Oxide Thinning at STI Corner Edge for the Devices Using Thick Dual Gate Oxide
- Strong-Strong Beam-Beam Simulation for a Muon-Collider Ring : Instrumentation, Measurement, and Fabrication Technology
- Design of a Transverse Ionization-Cooling Channel in Solenoidal Focusing Field : Instrumentation, Measurement, and Fabrication Technology