Nishimura N | Canon Inc. Tokyo Jpn
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概要
Canon Inc. Tokyo Jpn | 論文
- Molecular design of o-nitrobenzyl phenol ether for photo-deprotection resist; challenge to half-pitch 22nm using near-field lithography
- Synthesis of BaTiO_3 Thin Films Substituted with Hafnium and Zirconium by a Laser Ablation Method Using the Fourth-harmonic Wave of a YAG Laser
- Optical Properties of Ba_2NaNb_5O_ Film Fabricated by RF Magnetron Sputtering Method
- Dimensional Crossover Effect of Pinning in YBa_2Cu_3O_7 Films
- Growth Style of Bi_4Ti_3O_ Thin Films on CeO_2/Ce_Zr_O_2 Buffered Si Substrates