Ooka Masahiro | Research Center For Nanodevices And Systems Hiroshima University
スポンサーリンク
概要
関連著者
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Yokoyama Shin
Research Center For Integrated Systems Hiroshima University
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Ooka Masahiro
Research Center For Nanodevices And Systems Hiroshima University
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Yokoyama Shin
Research Center for Nanodevices and Systems, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan
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Ooka Masahiro
Research Center for Nanodevices and Systems, Hiroshima University, Higashi-Hiroshima 739-8527, Japan
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Ooka Masahiro
Research Center for Nanodevices and Systems, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan
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Yokoyama Shin
Research Center for Nanodevices and Systems, Hiroshima University, Higashi-Hiroshima 739-8527, Japan
著作論文
- Contact-Hole Etching with NH3-Added C5F8 Pulse-Modulated Plasma
- SiO2 Hole Etching Using Perfluorocarbon Alternative Gas with Small Global Greenhouse Effect
- Effect of H2 Addition during Cu Thin-Film Sputtering