HAMADA Toshimasa | System LCD Group Process Development Laboratories, SHARP Corporation

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概要

関連著者

Itoga Takashi
System Lcd Group Process Development Laboratories Sharp Corporation
Nakata Yukihiko
Display Development Group Sharp Corporation:(present Address)advanced Lcd Technologies Development C
OKAMOTO Tetsuya
Display Development Group, SHARP Corporation
HAMADA Toshimasa
System LCD Group Process Development Laboratories, SHARP Corporation
ISHII Yutaka
Display Development Group, SHARP Corporation
Okamoto Tetsuya
Display Development Group Sharp Corporation:(present Address)advanced Lcd Technologies Development C
Hamada Toshimasa
System Lcd Group Process Development Laboratories Sharp Corporation
Ishii Yutaka
Display Development Group Sharp Corporation

著作論文

Low-Temperature Gate Insulator for Poly-Si Thin Film Transistors by Combination of Photo-Oxidation and Plasma Enhanced Chemical Vapor Deposition Using Tetraethylorthosilicate and O_2 Gases(Special Issue on Electronic Displays)

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