Noda S | Univ. Tokyo Tokyo Jpn
スポンサーリンク
概要
関連著者
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Noda S
Univ. Tokyo Tokyo Jpn
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Komiyama H
Department Of Chemical System Engineering School Of Engineering University Of Tokyo
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Hu Minghui
Department Of Chemical System Engineering The University Of Tokyo
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山口 由岐夫
Univ. Tokyo Tokyo Jpn
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Yamaguchi Y
Department Of Chemical System Engineering The University Of Tokyo
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HU Minghui
Department of Chemical System Engineering, The University of Tokyo
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Okubo T
Department Of Chemical System Engineering The University Of Tokyo
著作論文
- Initial growth stage of nanoscaled TiN films: Formation of continuous amorphous layers and thickness-dependent crystal nucleation.
- A new insight into the growth mode of metals on TiO2(110).
- Structural and morphological control of nanosized Cu islands on SiO2 using a Ti underlayer.
- Effect of interfacial interactions on the initial growth of Cu on clean SiO2 and 3-mercaptopropyltrimethoxysilane-modified SiO2 substrates.
- Structure and morphology of self-assembled 3-mercaptopropyltrimethoxysilane layers on silicon oxide.
- Effects of substrate heating and biasing on nanostructural evolution of nonepitaxially grown TiN nanofilms.
- Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111).