Miake Takeshi | Sony Semiconductor Kyushu Co.

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概要

• Miake Takeshiの詳細を見る
• 同名の論文著者
• Sony Semiconductor Kyushu Co.の論文著者

関連著者

• 肥後 盛秀

  国立大学法人 鹿児島大学大学院 理工学研究科 化学生命・化学工学専攻

• 肥後 盛秀

  鹿児島大学工学部応用化学工学科

• YOSHIDOME Toshifumi

  Department of Applied Chemistry and Chemical Engineering, Faculty of Engineering, Kagoshima Universi

• MITSUSHIO Masaru

  Department of Applied Chemistry and Chemical Engineering, Faculty of Engineering, Kagoshima Universi

• HIGO Morihide

  Department of Applied Chemistry and Chemical Engineering, Faculty of Engineering, Kagoshima Universi

• Higo Morihide

  Department Of Applied Chemistry And Chemical Engineering Faculty Of Engineering Kagoshima University

• Miake Takeshi

  Sony Semiconductor Kyushu Co.

• OZONO Yoshihisa

  Center for Instrumental Analysis, Kagoshima University

• Ozono Yoshihisa

  Center For Instrumental Analysis Kagoshima University

• Mitsushio Masaru

  Department Of Applied Chemistry And Chemical Engineering Faculty Of Engineering Kagoshima University

• Yoshidome T

  Department Of Applied Chemistry And Chemical Engineering Faculty Of Engineering Kagoshima University

• Yoshidome Toshifumi

  Department Of Applied Chemistry And Chemical Engineering Faculty Of Engineering Kagoshima University

• MITSUSHIO Masaru

  Graduate School of Science and Engineering, Kagoshima University

• Mitsushio Masaru

  Graduate School Of Science And Engineering Kagoshima University

• 肥後 盛秀

  Dep. Of Chemistry Biotechnology And Chemical Engineering Graduate School Of Sci. And Engineering Kag

• Yamagata Toshiyuki

  Graduate School Of Sci. And Engineering Kagoshima Univ.

• MIAKE Takeshi

  Department of Applied Chemistry and Chemical Engineering, Faculty of Engineering, Kagoshima Universi

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著作論文

• Adsorption State and Morphology of Anthraquinone-2-carboxylic Acid Deposited from Solution onto the Atomically-Smooth Native Oxide Surface of Al(111) Films Studied by Infrared Reflection Absorption Spectroscopy, X-ray Photoelectron Spectroscopy, and Atomi
• Anthraquinone-2-carboxylic Acid Deposited from Solution onto Native Oxide Surfaces of Al Films Characterized by Inelastic Electron Tunneling Spectroscopy, X-ray Photoelectron Spectroscopy, and Atomic Force Microscopy

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