Hsiung S‐k | Institute Of Electronic Engineering Chung Yuan Christian University

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Institute Of Electronic Engineering Chung Yuan Christian University | 論文

• Characterization of a-Si:H Phase Transformation and Crystallization by Isothermal Annealing
• Titanium Nitride Membrane Application to Extended Gate Field Effect Taansistor pH Sensor Using VLSI Technology : Semiconductors
• SnO_2 Thin Film Prepared By R.F. Reactive Sputtering For SnO_2/Si_3N_4/SiO_2 Gate ISFETs Applications
• Wire Planning for Electromigration and Interference Avoidance in Analog Circuits

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