高木 英典 | 東大工:東大新領域:CREST
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概要
論文 | ランダム
- Patterning Characteristics of 0.1-μm Line-and-Space Patternin Synchrotron Radiation Lithography
- Voltage Attenuator Consisting of Two MOSFET's in Weak Inversion Region
- Proximity Effect on Patterning Characteristics of Hole Patterns in Synchrotron Radiation Lithography
- A Distributed Device Model for Hot-Electron Bolometers(Special Issue on Superconductive Electronics)
- Holographic Renormalization Group Structure in Higher-Derivative Gravity