IKOMA Toshiaki | Texas Instruments Tsukuba Research & Development Center Ltd.
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概要
Texas Instruments Tsukuba Research & Development Center Ltd. | 論文
- The Effects of La and Nb Modification on Fatigue and Retention Properties of Pb(Ti, Zr)O_3 Thin-Film Capacitors
- Radiation Hardness of Epitaxial and Non-Epitaxial 6H-SiC MOS Capacitors
- A New Two-Dimensional Parallel Block Adaptive Filter with Reduced Computational Complexity(Special Section of Papers Selected from ITC-CSCC'97)