SHAIK Khaja | Institut supérieur délectronique de Paris (ISEP)
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概要
論文 | ランダム
- Role of Frictional Force on the Polishing Rate of Cu Chemical Mechanical Polishing
- 〔958〕転造加工の各種応用例 〔C.T.Appleton, Amer.Machinist, 1960-3-7, Vol.104, No.5, p.116〜117, 図5〕
- NEW MATERIALS FOR DDS FROM A CLINICAL VIEW
- Resolution of 3-(methylamino)-1-(2-thienyl)propan-1-ol, a new key intermediate for duloxetine, with (S)-mandelic acid
- Synthesis of enantiopure 6-methoxy-2-naphthylglycolic acid and its application as a resolving agent