Hojo Fusao | Hitachi Research Laboratory, Hitachi, Ltd., 7-1-1 Omika-cho, Hitachi, Ibaraki 319-1292, Japan
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- Hitachi Research Laboratory, Hitachi, Ltd., 7-1-1 Omika-cho, Hitachi, Ibaraki 319-1292, Japanの論文著者
Hitachi Research Laboratory, Hitachi, Ltd., 7-1-1 Omika-cho, Hitachi, Ibaraki 319-1292, Japan | 論文
- A Novel Plasma Etching Tool with RF-Biased Faraday-Shield Technology: Chamber Surface Reaction Control in the Etching of Nonvolatile Materials
- Polymer-Ceramic Nanocomposites Based on New Concepts for Embedded Capacitor
- Low Temperature Processing of Crystalline Lead Zirconate Titanate (PZT) Film and the Direct Micropatterning by Laser-Induced Pyrolysis of a Sol-Gel-Derived Film
- Electrical Properties of Anodically Oxidized Nb2O5 and Si-Doped Nb2O5 Films