Suzuki Takashi | Fujitsu Laboratories Ltd., Akiruno Technology Center
スポンサーリンク
概要
Fujitsu Laboratories Ltd., Akiruno Technology Center | 論文
- Thermal Expansion Coefficients of Nano-Clustering Silica (NCS) Films Measured by X-Ray Reflectivity and Substrate Curvature Methods
- Effect of Implanted Oxygen and Nitrogen on Mobility and Generation of Dislocation in SiGe/Si Heterostructure