FUKAMI T. | Materials & Electronic Devices Laboratory Mitsubishi Electric Corporation
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Materials & Electronic Devices Laboratory Mitsubishi Electric Corporation | 論文
- Fe and Al Concentrations in High Resistivity InP Layer Grown by Low-Temperature Liquid Phase Epitaxy
- Formation of As-Grown BiSrCaCuO Thin Films by Sputtering Three Targets Heavily Doped with Pb in Atmospheres of O_2 and N_2O/O_2 Mixtures
- Electric Properties of SrTiO_3 Thin Films Prepared by RF Sputtering
- Preparation of Sr(Zr, Ti)O_3 Ceramics and Their Dielectric Properties at Microwave Frequencies
- The Effect of Mn Addition on Dielectric Properties and Microstructure of BaO-Nd_2O_3-TiO_2 Ceramics : Dielectric Properties