Nakamura Hiroko | Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation | 論文
- Preparation of SrBi_2Ta_2O_9 Thin Films Consisting of Uniform Grains at Low Temperature by Metalorganic Chemical Vapor Deposition : Electrical Properties of Condensed Matter
- Measurement of Wave-Front Aberrations in Lithography Lenses with an Overlay Inspection Tool