KAI Toshiyuki | Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation
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- Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporationの論文著者
Semiconductor Materials Laboratory, Fine Electronic Materials Research Laboratories, JSR Corporation | 論文
- Synthesis of Photocrosslinkable Hyperbranched Polysulfide Containing Methacryloyl Groups by the Reaction of Bis(oxetane) with Thiocyanuric Acid Followed by the Reaction with Methacrylic Anhydride
- Synthesis of a photocrosslinkable hyperbranched polyester containing methacryloyl groups by the reaction of 1,4-bis(chloromethyl)benzene with 1,3,5-benzenetricarboxylic acid followed by reaction with methacrylic acid
- Synthesis of Photocrosslinkable Hyperbranched Polyesters with Terminal Methacryloyl Groups by the One-pot Polyaddition of Bis(oxetane)s with 1,3,5-Benzenetricarboxylic Acid and Methacrylic Acid
- Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups