KANAYAMA T. | MIRAI-Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST)

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MIRAI-Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST) | 論文

• Characterization of pore sealing effect on trench sidewalls in porous low-k films by vapor adsorption in-situ spectroscopic ellipsometry

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