Negishi Keisuke | Department of Applied Chemistry, Faculty of Engineering, Gunma University
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Department of Applied Chemistry, Faculty of Engineering, Gunma University | 論文
- Selective Si-Si Bond Cleavage of Decaisopropylbicyclo[2.2.0]hexasilane with Hydrobromic Acid and Hydrochloric Acid
- Highly Planar Silane[(i-Pr)_3Si]_3SiH and Silyl Radical[(i-Pr)_3Si]_3Si・
- Ring-Opening Reactions of anti-Dodecaisopropyltricyclo [4. 2. 0. 0^] octasilane. Formation of Novel Bicyclo [3. 3. 0] octasilane and Bicyclo [4. 2. 0] octasilane Systems
- Persistent Tris (t-butyldimethylsilyl) silyl Radical and Its New Generation Methods
- Fabrication of Step-Edge Junctions on the Concave or Convex Side of YBa_2Cu_3O_ Film