TOYODA Takeshi | Industrial Research Institute of Ishikawa
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概要
Industrial Research Institute of Ishikawa | 論文
- セラミックスの3次元微細加工技術
- Cat-CVD 法によるガスバリア膜の低温形成
- Microstructure and Properties of TiAlN/a-C Nanocomposite Coatings Prepared by Reactive Sputtering
- Crystallographic Orientation Relationship between Discontinuous Precipitates and Matrix in Commercial AZ91 Mg Alloy
- E-2 Ultrasonic Linear Actuator Using Elastic Hinge Structure(Bulk wave devices, High power ultrasound)