Shikada Tsutomu | Advanced Technology Research Center, NKK Corporation
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概要
Advanced Technology Research Center, NKK Corporation | 論文
- Room-Temperature Synthesis of ZnS:Mn Films by H_2 Plasma Chemical Sputtering
- 400℃までの温度におけるSiO_2-AlPO_4系の相平衡の検討
- Characterization of μc-Si:H Films Prepared by H_2 Sputtering
- Solidification and roll-bonding of shells in twin-roll casting process.
- Cup Drawing of Strongly Textured Titanium Sheets.