HOSONO Yasuharu | 論文著者

Advanced Discrete Semiconductor Technology Laboratory, Corporate R&D Center, Toshiba Corporation

Advanced Discrete Semiconductors Technology Laboratory Corporate R&d Center Toshiba Corporation

Advanced Discrete Semiconductors Technology Laboratory, Corporate R&D Center, Toshiba Corporation

Advanced Discrete Semiconductors Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan

Advanced Electron Devices Laboratory, Corporate R&D Center, Toshiba Corporation

Advanced Electron Devices Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai, Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan

Corporate R&d Center Toshiba Corp.

Corporate R&d Center Toshiba Corporation

Corporate R&D Center, Toshiba Corp.

Corporate R&D Center, Toshiba Corporation, Saiwai-ku, Kawasaki 212-8582, Japan

Corporate R&D Center, Toshiba Corporation

Corporate Research & Development Center Toshiba Corp.

Corporate Research & Development Center, Toshiba Corp.

Corporate Research & Development Center, Toshiba Corp., 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan

Corporate Research and Development Center, Toshiba Corp., 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan

Corporate Research and Development Center, Toshiba Corporation, 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan

Corporate Research and Development Center, Toshiba Corporation, Kawasaki 212-8582, Japan

Corporate Research and Development Center, Toshiba Corpotation

Materials and Devices Research Laboratories, R&D Center, Toshiba Corporation, Toshiba Yanagi–cho Works #18–2F, 70 Yanagi–cho, Saiwai–ku, Kawasaki 210–8501, Japan

Materials and Devices Research Laboratories, R&D Center, Toshiba Corporation