HIRANO Ryuichi | 論文著者

Compound Semiconductor Materials Department, Nikko Materials Co. Ltd.

Compound Semiconductor Materials Department, Nikko Materials Co. Ltd., 187-4, Usuba, Hanakawa, Kitaibaraki 319-1535, Japan

Department of Physics, Gakushuin University

EB Mask Equipment Engineering Group, EB Mask Equipment Engineering Department, Semiconductor Equipment Division, Toshiba Machine Co., Ltd.

Electric Material Group, Thin Film Material Division, JX Nippon Mining & Metals Corporation, Chiyoda, Tokyo 100-8164, Japan

Japan Energy Corporation Compound Semiconductor Materials Department

Japan Energy Corporation, Compound Semiconductor Materials Department

Japan Energy Corporation, Compound Semiconductor Materials Department, 187–4 Usuba, Hanakawa, Kitaibaraki, Ibaraki 319–15, Japan

Nikko Materials Co. Ltd. Compound Semiconductor Materials Department

Nikko Materials Co., Ltd., Compound Semiconductor Materials Department, 187-4, Usuba, Hanakawa, Kitaibaraki, Ibaraki 319-15, Japan

Nikko Materials Co.,Ltd., Compound Semiconductor Materials Department