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フォトポリマー懇話会 | 論文
- Methacrylonitrile Based Si-Containing Polymers for 157-nm Positive Resist.
- Recent progress in the utilization of plasma processing techniques for 0.25 micron X-ray lithography.
- Preparation and Properties of Porous Polyimide Films Prepared by the Pyrolysis of Poly(urethane-imide) Films.
- Spectroscopic Studies of Radicals Formed upon Photoexcitation of Bis(nitrostyrylpyridinium)alkane Ditetraphenylborate Salts.
- Photodegradation of Poly(methacrylates), Poly(acrylates) and Polystyrene Derivatives by 146nm Light.
- Nature of plasma-induced free radicals in polycarbohydrates studied by electron spin resonance.
- The Influence of Photoacid Structure on the Design and Performance of 1 93-nm Resists.
- Recent advancements in 193 nm step and scan lithography.
- Laser ablation of various polymer materials.
- Synthesis, Characterization, and Optical Properties of Uniaxially Drawn and Gold Nanoparticle Dispersed Fluorinated Polyimide Films.
- Photodimerization of Thymine Derivatives in Single Crystal.
- Synthesis, structure and photosensitivity of isoprene-resorcin resin.
- Current Status of the EUV Engineering Test Stand.
- Study of advanced 193nm resists. Material properties and lithographic performance.
- Towards a better understanding of positive chemically amplified systems.
- Study on thermal curing in ester type photosensitive polyimide.
- Postexposure Delay Effect in Chemically Amplified Resists.
- Photopolymer Materials for Holography.
- Current Status of EUV Lithography.
- Output Power Stabilization of Laser Diode Pumped Solid State Blue Light Generation.