Homogeneous nano-patterning using plasmon-assisted photolithography
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概要
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We report an innovative lithography system appropriate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photolithography. The key technology is two-photon photochemical reactions of a photoresist induced by plasmonic near-field light and the scattering component of the light in a photoresist film. The scattering component of the light is a radiation mode from higher order localized surface plasmon resonances scattered by metallic nanostructures.
- 2011-07-04
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