Plasma-Deposited SiOxCyHz Barrier Coatings for Organic Device Encapsulation (Plasmas, applied atomic and molecular physics, and applied nuclear physics)
スポンサーリンク
概要
著者
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Lee Seunghun
Korea Institute of Materials Science, 66 Sangnam-dong, Changwon 641-831, Korea
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Kim Jong-Kuk
Korea Institute of Materials Science, 66 Sangnam-dong, Changwon 641-831, Korea
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Kim Do-Geun
Korea Institute of Materials Science, 66 Sangnam-dong, Changwon 641-831, Korea
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Kim Jong-Kuk
Korea Institute of Materials Science, Changwon 642-831, Republic of Korea
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Kang Yong-Jin
Korea Institute of Materials Science, Changwon 642-831, Republic of Korea
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Jung Sunghoon
Korea Institute of Materials Science, Changwon 642-831, Republic of Korea
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Kim Do-Geun
Korea Institute of Materials Science, Changwon 642-831, Republic of Korea
関連論文
- Hydrogenated Amorphous Carbon Films Prepared by Filtered Vacuum Arc Method with Various C2H2 Pressures
- Plasma-Deposited SiO
- Plasma-Deposited SiOxCyHz Barrier Coatings for Organic Device Encapsulation (Plasmas, applied atomic and molecular physics, and applied nuclear physics)