EUV resist outgassing: quantification and release mechanisms

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Santillan Julius

  Semiconductor Leading Edge Technologies Inc.

関連論文

• The Emergence of Alternative Developers for Extreme Ultraviolet Lithography
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• EUV resist outgassing: quantification and release mechanisms
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• Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists
• Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication

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