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論文 | ランダム
- Flare Impact and Correction for Critical Dimension Control with Full-Field Exposure Tool
- Resist Reflow Process for 32 nm Node Arbitrary Pattern
- Resistive Switching Ion-Plug Memory for 32-nm Technology Node and Beyond
- Mitigation of Complementary Metal–Oxide–Semiconductor Variability with Metal Gate Metal–Oxide–Semiconductor Field-Effect Transistors
- Narrow Metal-Filled Trench as a Source/Drain Contact for Three-Dimensional Metal–Oxide–Semiconductor Field Effect Transistor