2C42 化学修飾されたゲル膜の光分解による Al_2O_3-SiO_2 系非晶質薄膜の微細パターニング
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The effects of UV-irradiation on the properties of Al_2O_3-SiO_2 gel films derived from chemically modified Al(O-sec-Bu)_3 and Si(OEt)_4 have been studied. The gel films containing Al_2O_3 more than 30mol% showed appreciable photosensitivity and were applicable to the fine-patterning of non-crystalline films in the Al_2O_3-SiO_2 system.
- 1996-04-02
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