Effect of VI/II Gas Ratio on the Epitaxial Growth of ZnO Films by Metalorganic Chemical Vapor Deposition
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概要
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We report the effect of the VI/II ratio on the metalorganic chemical vapor deposition (MOCVD) growth of ZnO film. The surface of ZnO film becomes very smooth as the VI/II ratio increases. Atomic force microscopy measurement shows that ZnO films grown at a VI/II ratio of 25,000 have atomically flat terraces with a root-mean-square roughness of 0.2 nm. Low-temperature photoluminescence spectra also reveal a very sharp excitonic emission comprised of a neutral donor bound exciton emission and a free exciton emission with first and second longitudinal optical (LO) phonon replicas, indicating that the ZnO epilayer is of a high optical quality.
- 2011-10-25
著者
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Park Seong-ju
Department Of Materials Science And Engineering And Center For Optoelectronic Materials Research Kwa
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Kang Jang-Won
School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Republic of Korea
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Choi Yong-Seok
School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Republic of Korea
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Hwang Dae-Kue
Public and Original Technology Research Center, Daegu-Gyeongbuk Institute of Science and Technology, Daegu 711-873, Republic of Korea
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Kwon Bong-Joon
National Research Laboratory for Nano-Bio-Photonics, Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea
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Cho Yong-Hoon
National Research Laboratory for Nano-Bio-Photonics, Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea
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Park Seong-Ju
Department of Nanobio Materials and Electronics, Gwangju Institute of Science and Technology, Gwangju 500-712, Republic of Korea
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KANG Jang-Won
School of Materials Science and Engineering, Gwangju Institute of Science and Technology
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