Nanomechanical Thermal Analysis of Indium Films Using Silicon Microcantilevers
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概要
- 論文の詳細を見る
Indium thin films of different thicknesses were vacuum-deposited onto silicon microcantilevers. The temperature-dependent variations in the resonance frequency and deflection of the cantilevers were measured simultaneously and were used to determine the melting and crystallization temperatures of the indium films. The melting temperatures of the indium films were identical to that of bulk indium, whereas the crystallization temperatures decreased as the film thickness decreased. The reduction in crystallization temperature with decreasing thickness can be attributed to the tendency of thin films to homogeneously nucleate on nonwetting surfaces. Finally, the temperature-dependent variations in the Young's modulus and surface stress of the indium film were calculated.
- 2012-08-25
著者
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Rhee Shi-woo
Department Of Chemical Engineering Pohang University Of Science And Technology(postech)
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Lim Sang-Hoon
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk 790-784, Republic of Korea
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Yim Changyong
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk 790-784, Republic of Korea
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Yun Minhyuk
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk 790-784, Republic of Korea
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Kim Seonghwan
Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada
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Jung Namchul
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk 790-784, Republic of Korea
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Lee Moonchan
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk 790-784, Republic of Korea
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Thundat Thomas
Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada
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Jeon Sangmin
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk 790-784, Republic of Korea
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Rhee Shi-Woo
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk 790-784, Republic of Korea
関連論文
- Effect of Back-Channel Plasma Etching on the Leakage Current of a-Si:H Thin Film Transistors
- Nanomechanical Thermal Analysis of Indium Films Using Silicon Microcantilevers