Application of Solid Immersion Lens-Based Near-Field Recording Technology to High-Speed Plasmonic Nanolithography

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概要

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• In this paper, we proposed a high-speed and high-throughput plasmonic nanolithography technique that uses a fabricated sharp-ridged nanoaperture on a solid immersion lens (SIL) and a precise active nanogap control algorithm. This plasmonic lithography with high throughput can make an optical spot with a diameter of the order of 10 nm and can perform nanopatterning at sub-m/s speed. An optical high-throughput head was designed on a metallic aluminum aperture by optimizing the geometric parameters of a sharp-ridged antenna on the basis of the optical intensity and spot size. Using the evanescent field generated from the SIL, the plasmonic SIL could be maintained below 20 nm above a photoresist-coated Si-wafer and could move at a speed of greater than 200 mm/s without friction; the patterning of lines could be performed under this condition. We achieved patterning with a line width (full-width at half-magnitude, FWHM) of 130 nm.

• 2012-08-25

著者

• Yang Hyunseok

  School Of Mechanical Engineering Yonsei University

• Min Byung-kwon

  School Of Mechanical Engineering Yonsei University

• Min Byung-Kwon

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

• Kim Taeseob

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

• Kang Sung-Mook

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

• Park Kyoung-Su

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

• Lee Won-Sup

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

• Joe Hang-Eun

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

• Park Young-Pil

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

• Park No-Cheol

  School of Mechanical Engineering, Yonsei University, Seoul 120-749, Korea

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• Application of Solid Immersion Lens-Based Near-Field Recording Technology to High-Speed Plasmonic Nanolithography
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