Study of Strain and Giant Magnetoresistance of Co/Cu Magnetic Multilayers

概要

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The electrical resistivity <TEX>$\rho$</TEX> in various magnetic fields and the structure of [Co(1.02 nm)/Cu(<TEX>$t_{\text{Cu}}$</TEX>)]25 magnetic multilayers (MML) have been investigated to clarify the relationship between the transport properties (electrical resistivity and magnetoresistance) and structure (orientation and strain of these layers). The in−plane compressive strain <TEX>$\varepsilon$</TEX> of antiferromagnetic (AF) Co/Cu MML with <TEX>$t_{\text{Cu}}=1.05$</TEX> nm is larger than that of ferromagnetic (F) Co/Cu MML with <TEX>$t_{\text{Cu}}=0.76$</TEX> nm. Furthermore, it is found that <TEX>$\varepsilon$</TEX> of the AF−Co/Cu MML is proportional to the magnitude of giant magnetoresistance, whereas that of F−MML is independent of magnetoresistance. This implies that the strain in AF−Co/Cu MMLs showing GMR is closely related to the spin−dependent scattering of conduction electrons at interfaces.
2006-07-15