What We Learned and Used in the First Inductively Coupled Plasma for Plasma Processing and in Later Development
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概要
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The first inductively coupled plasmas (ICPs) for plasma processing, also called radio frequency induction (RFI), were developed at IBM, East Fishkill, NY, U.S.A. These were extremely efficient at producing high density plasma. This paper will discuss: 1) How to drive the antenna to get high plasma density with low plasma voltage and low capacitively coupled plasma (CCP) losses, 2) low matching losses, 3) the optimum way (presets) to start an ICP, 4) frequency effects, and 5) achieving high plasma stability.
- 2011-08-25
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