Effects of Heat Treatment on the Resistive Switching Characteristics of Pt/NiO/Pt Stack Structures

概要

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Effects of heat treatment on the resistive switching characteristics of Pt/NiO/Pt cells were investigated. Heat treatment was carried out under various conditions, and different resistive switching characteristics were obtained depending on the oxygen desorption from NiO films. After heat treatment by which the oxygen composition of the NiO films was not changed, the resistance ratio was markedly improved owing to the increase in the initial resistance ($R_{\text{Ini}}$). It was revealed that the increase in $R_{\text{Ini}}$ is linked to the increase in its activation energy, which may be related to carrier excitation from defect states. On the other hand, many of the cells were initially in the low-resistance state after heat treatment by which the oxygen desorption from NiO films took place. This result indicates the formation of conductive filaments by oxygen desorption.
2011-08-25