Ultrasonic Spray-Assisted Solution-Based Vapor-Deposition of Aluminum Tris(8-hydroxyquinoline) Thin Films
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概要
- 論文の詳細を見る
Aluminum tris(8-hydroxyquinoline) (Alq3) thin films were fabricated by a vapor-deposition technique from its methanol solution, that is, by the ultrasonic-assisted mist deposition technique. The application of high ultrasonic power to the Alq3--methanol mixture resulted in a stable and transparent solution. Mist particles formed by ultrasonic atomization of the solution were used as the source for vapor-deposition at the substrate temperature of 100--200 °C. Optical absorption and photoluminescence characteristics indicated the formation of Alq3 thin films. The results promise the formation of thin films of a variety of organic materials by the solution-based technique.
- 2011-02-25
著者
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Fujita Shizuo
Photonics And Electronics Science And Engineering Center Kyoto University
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Ikenoue Takumi
Department Of Electrical Engineering Kyoto University
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Ikenoue Takumi
Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan
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Katori Shigetaka
Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan
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Piao Jinchun
Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan
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