Numerical simulation of electron transport in electric and magnetic fields for analysis of electron temperature and number density profiles measured in an argon magnetic neutral loop discharge plasma
スポンサーリンク
概要
- 論文の詳細を見る
A Monte Carlo simulation of electron transport in electric and magnetic fields was performed to analyze experimental data of the electron temperature T_e and electron number density n_e measured in a magnetic neutral loop discharge (NLD) plasma driven in Ar at 0.13 Pa. T_e and n_e in the vicinity of the substrate holder were measured with a triple probe, and their radial profiles had peaks at different radial positions. The simulation reproduced these peak positions well under the chosen boundary condition that the electron reflectivity of the side wall was lower than that of the reactor ceiling and the substrate holder. It was explained that the T_e peak was formed by high-energy electrons transported from the neutral loop along a separatrix of the quadrupole magnetic field and that the n_e peak consisted of electrons undergoing reciprocating motion between the reactor ceiling and the substrate.
- 2010-08-25
著者
-
Sugawara Hirotake
Graduate School Of Engineering Hokkaido University
-
Ogata Seiji
Institute Of Physics University Of Tsukuba
-
Kuwahara Kiyoshi
Research and Development Division, ULVAC, Inc., 2500 Hagizono, Chigasaki, Kanagawa 253-8543, Japan
-
Osaga Tsuyoshi
Graduate School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
-
Tsuboi Hideo
Industrial Engineering Center, ULVAC, Inc., 2500 Hagizono, Chigasaki, Kanagawa 253-8543, Japan
-
Ogata Seiji
Institute of Semiconductor and Electronics Technologies, ULVAC, Inc., 1220-1 Suyama, Susono, Shizuoka 410-1231, Japan
関連論文
- Carbon-Nanotube Growth in Alcohol-Vapor Plasma
- Evaluation of Ion and Radical Fluxes in CH_4/H_2 Plasma for CNT Growth
- Timesaving techniques for decision of electron–molecule collisions in Monte Carlo simulation of electrical discharges
- Analysis of Oxidation State of Multilayered Catalyst Thin Films for Carbon Nanotube Growth Using Plasma-Enhanced Chemical Vapor Deposition
- Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas
- Two-peaked velocity distribution function of electrons in carbon tetrafluoride in crossed electric and magnetic fields
- 1D fluid modeling of Xe/Ar/Ne filled PDP
- The drift velocity vector of electron swarms in crossed electric and magnetic fields
- Fluorinated Carbon Films with Low Dielectric Constant Made from Novel Fluorocarbon Source Materials by RF Plasma Enhanced Chemical Vapor Deposition
- Rotationally Resolved Photoelectron Asymmetry Parameter of H_2 Using Ne-I 736A^^○ Radiation
- Numerical simulation of electron transport in electric and magnetic fields for analysis of electron temperature and number density profiles measured in an argon magnetic neutral loop discharge plasma
- Analysis of Oxidation State of Multilayered Catalyst Thin Films for Carbon Nanotube Growth Using Plasma-Enhanced Chemical Vapor Deposition
- Scattering-Based Stochastic Process Attracting Electrons Inward under Antiparallel Gradient Magnetic Fields
- Hydrogen-Sensing Response of Carbon-Nanotube Thin-Film Sensor with Pd Comb-Like Electrodes