Development of a Polymer Coating-Based Microlens Array on Isotropically Wet-Etched Quartz Substrates for Maskless Lithography Application

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A polymer coating-based microlens array (MLA) was developed on an isotropically wet-etched quartz substrate for maskless photolithography application. The developed MLA showed excellent light focusing ability and uniformity, and a dense fill factor. The obtained focal length ranged from 32.2 to 45.4 μm depending on the curvature of quartz and the thickness of an ultraviolet (UV) adhesive. A small spot size of 1.55 μm and an uniformly focused beam intensity were obtained at the focal plane, confirming that the fabricated MLA has excellent uniformity and good focal ability. The fabricated MLA was applied to UV lithography. Beams were well focused onto a photoresist when UV passed through the MLA. Depending on the variable distance from the MLA, beam size on the photoresist was controlled. Variable micropatterns were realized on the photoresist. Even at high a temperature, the interface between quartz and the UV adhesive was thermally stable and lens performance characteristics remained unchanged.
2010-06-25