Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition

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概要

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• A carbon-shunting arc discharge was generated with a titanium cathode for titanium-containing carbon plasma production to deposit carbon-based hybrid films. A carbon rod of 2 mm diameter and 40 mm length was employed for generation of the carbon shunting arc discharge. A silicon substrate was immersed into the plasma, and a series of negative pulse voltages were applied to the substrate holder synchronized with shunting arc discharge ignition. The cathode side rod holder material was changed from carbon to titanium to supply holder material particles into the carbon shunting arc plasma. The shunting arc plasma was successfully produced for both rod holder materials. Heating energy to generate the shunting arc was reduced using titanium as the cathode side holder material. A spectroscopic measurement from plasma light emission showed that the produced plasma contained titanium ions at employing titanium as the cathode material. The ions contained in the produced plasma were extracted with $-2.0$ kV negative pulse voltage. The ion current at the titanium cathode was larger value than that of the carbon cathode. X-ray photoelectron spectroscopy showed that the prepared carbon films contained titanium and showed a Ti/C ratio of 0.099 at 1200 V charging voltage of a 200 μF capacitor.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2010-04-25

著者

• Takaki Koichi

  Department Of Electrical And Electronic Engineering Iwate University

• Murakami Takayuki

  Department Of Urology Yokohama City University Graduate School Of Medicine

• Mukaigawa Seiji

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Iwate University

• Ken Yukimura

  Department of Electrical Engineering, Doshisha University, 1-3 Tatara-Miyakodani, Kyotanabe, Kyoto 610-0321, Japan

• Tamiya Fujiwara

  Department of Electrical and Electronic Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551, Japan

• Seiji Mukaigawa

  Department of Electrical and Electronic Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551, Japan

• Koichi Takaki

  Department of Electrical and Electronic Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551, Japan

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