Ultrafast Optical Response of InAlAs/InAs/InGaAs Pseudomorphic High Electron Mobility Transistors
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概要
- 論文の詳細を見る
High-electron-mobility transistors with a pseudomorphically strained InAs channel (InAs-PHEMTs) have excellent electron transport properties and a high electron density, which are due to their large conduction band discontinuity. In this work, we show the dependence of optical response on drain-to-source voltage ($V_{\text{DS}}$) for InAs-PHEMTs and clarify the physical mechanism for the response time. The experimental results can be explained successfully using two different lifetimes, one dominated by the time required for a hole to transit from the channel to the source region under the channel field and the other dominated by Auger recombination. To numerically understand the optical response, we estimate minority carrier lifetime using the Auger recombination theory. The theoretical result agrees well with the experimental result.
- 2010-04-25
著者
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Taguchi Hirohisa
Department Of Internal Medicine 5 Tokyo Medical University
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Takahisa Ando
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Oishi Yasuyuki
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Ando Takahisa
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Kazuya Uchimura
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Miho Mochiduki
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Mitsuhiro Enomoto
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Tsutomu Iida
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Yoshifumi Takanashi
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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Yasuyuki Oishi
Department of Materials Science and Technology, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
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