Method of Low-Temperature Conversion of Pehydropolysilazane into Amorphous SiOx in Aqueous Solutions

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We investigated low-temperature SiOx conversion methods for the spin-coated perhydropolysilazane (a diluted dibutyl-ether solution) films prepared on (100) Si substrates under different curing schemes. From the Fourier transform-infrared (FTIR) spectroscopy and refractive index (RI) measurements, conversion to high-density SiOx was observed for the curing methods of dipping the coatings into various aqueous solutions such as H2O2, NH4OH, and deionized water with or without 405-nm ultraviolet irradiation at near room temperature. The SiOx films cured in H2O2 solution at 80 °C for 10 min exhibited a high conversion efficiency for the SiOx network, as observed from FTIR spectra, RI measurement (${\sim}1.46$), O/Si stoichiometry (${\sim}1.5$), surface smoothness (roughness $<1.1$ nm), and mechanical property (nanoindenter elastic modulus $\simeq42$ GPa), which are comparable to those of the conventional chemical-vapor-deposited SiOx films.
2010-11-25