Surface Treatment of Flat Panel Display Substrates by a Uniform Large Area Glow Cold Plasma Tunnel at Atmospheric Pressure
スポンサーリンク
概要
- 論文の詳細を見る
A novel, uniform, continuous, atmospheric pressure plasma tunnel (APPT), which was $400 \times 175 \times 2$ mm3, had been developed for surface treatment of flat panel display (FPD) glass substrates in-line at atmospheric pressure with gas mixtures containing argon and oxygen. The electrical properties of the glow plasma tunnel were presented by simultaneous measurement of current and voltage and the results showed that there were a big phase shift and big different amplitudes of current waveforms, which were due to the variation of the capacitance between the discharge electrodes, when the FPD glass substrate passed through the tunnel. The effects of the plasma treatment on the surface of the FPD glass substrate had also been studied by using contact angle measurement and scanning probe microscopy (SPM). The results showed that the wettability of the surface had an obvious improvement after the plasma treatment with the time of 10 second.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2009-09-25
著者
-
Zhao Lingli
Institute of Microelectronics, Chinese Academy of Science, 100029 Beijing, China
-
Wang Shouguo
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
-
Wan Jun
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
-
Jia Xianghong
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
-
Zhao Lingli
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
関連論文
- Photoresist Etching by Atmospheric Pressure Uniform-Glow Plasma
- Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of Borophosphosilicate Glass Films
- Surface Treatment of Flat Panel Display Substrates by a Uniform Large Area Glow Cold Plasma Tunnel at Atmospheric Pressure