Seamless Pattern Fabrication of Large-Area Nanostructures Using Ultraviolet Nanoimprint Lithography

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概要

• 論文の詳細を見る

• The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized $66 \times 45$ mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

• 2009-06-25

著者

• Kokubo Mitsunori

  Toshiba Machine Co. Ltd. Central Research Laboratory

• Shoji Shuichi

  School of Advanced Science and Engineering, Waseda University, Shinjuku, Tokyo 169-8555, Japan

• Kataza Shingo

  School of Advanced Science and Engineering, Waseda University, Shinjuku, Tokyo 169-8555, Japan

• Ishibashi Kentaro

  Toshiba Machine Co., Ltd., Numazu, Shizuoka 410-8510, Japan

• Goto Hiroshi

  Toshiba Machine Co., Ltd., Numazu, Shizuoka 410-8510, Japan

• Mizuno Jun

  School of Advanced Science and Engineering, Waseda University, Shinjuku, Tokyo 169-8555, Japan

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