Grating Substrates Fabricated by Nanoimprint Lithography for Fluorescence Microscopy
スポンサーリンク
概要
- 論文の詳細を見る
In this study, plastic grating substrates with subwavelength period were fabricated by nanoimprint lithography (NIL) and applied for the measurements of grating coupled-surface plasmon resonance (GC-SPR) field-enhanced fluorescence and fluorescence microscopic observation. Thermal and UV NIL were used for the fabrication of gratings. The grating fabricated by the latter process exhibited superior plasmon coupling characteristics to the former. The result of fluorescence detection indicated that the difference between the two structures fabricated by thermal and UV NIL affected the enhancement of fluorescence. Furthermore, the grating substrate with 39 nm groove depth fabricated by UV NIL produced an SPR dip, and it was found that the SPR of this grating substrate was dependent on duty ratio. The results of rigorous coupled wave analysis (RCWA) supported the experimental results well. The appropriate duty ratio of the grating fabricated by UV NIL with 39 nm groove depth was 0.6 to 0.8.
- 2009-06-25
著者
-
Nishii Junji
Photonics Research Institute Kansai Center National Institute Of Advanced Industrial Science And Tec
-
Kintaka Kenji
Photonics Research Institute Kansai Center National Institute Of Advanced Industrial Science And Tec
-
Tatsu Yoshiro
Research Institute For Cell Engineering National Institute Of Advanced Industrial Science And Techno
-
Tawa Keiko
Research Institute For Cell Engineering National Institute Of Advanced Industrial Science And Techno
-
Tawa Keiko
Research Institute for Cell Engineering, AIST, Ikeda, Osaka 563-8577, Japan
-
Akashi Naoko
Research Institute for Cell Engineering, AIST, Ikeda, Osaka 563-8577, Japan
-
Tatsu Yoshiro
Research Institute for Cell Engineering, AIST, Ikeda, Osaka 563-8577, Japan
-
Kintaka Kenji
Photonics Research Institute, AIST, Ikeda, Osaka 563-8577, Japan
-
Nishii Junji
Photonics Research Institute, AIST, Ikeda, Osaka 563-8577, Japan
関連論文
- Generation of Periodic Sawtooth Optical Intensity by Phase-Shifting Mask
- Welding of Transparent Materials Using Femtosecond Laser Pulses
- Estimation of the Refractive Index Change in Glass Induced by Femtosecond Laser Pulses
- Correlation between Ge E' Centers and Optical Absorption Bands in SiO_2:GeO_2 Glasses
- Bragg Grating Formation in Polyimide Waveguide by Ultraviolet Light Irradiation
- Temperature Dependence of B- and F-Doped SiO_2 Waveguide Bragg Grating on a Crystallized Glass Substrate
- 1P-204 ポリマー脂質二分子膜・流動性脂質二分子膜のハイブリッドモデル生体膜 : 側方拡散の抑制と相分離の誘起(生体膜/人工膜・構造物性,第46回日本生物物理学会年会)
- 1P342 Effects of fusogenic peptides on substrate supported planar lipid bilayers(12. Membrane dynamics,Poster Session,Abstract,Meeting Program of EABS & BSJ 2006)
- Formation of Microdots on the Surface of Densified Silica Glass by Thermal Relaxation
- Phase-Shifting Mask Design for Interference Exposure of Chirp Blazed Grating
- Three-Dimensional Waveguides Fabricated in Poly(methyl methacrylate) by a Femtosecond Laser
- Generation of Debris in Water-Assisted Femtosecond Laser Drilling of Silica Glass
- Fabrication of Dammann Gratings in Silica Glass Using a Filament of Femtosecond Laser
- Characterization of Micro-Channels Fabricated by In-Water Ablation of Femtosecond Laser Pulses
- Volume Grating Induced by a Self-Trapped Long Filament of Femtosecond Laser Pulses in Silica Glass
- Influence of Groove Depth and Surface Profile on Fluorescence Enhancement by Grating-Coupled Surface Plasmon Resonance
- Fabrication of glasses with low softening temperatures for mold-processing by ion-exchange(Fracture and Related Phenomena of Glasses)
- Application of Grating Substrate Fabricated by Nanoimprint Lithography to Surface Plasmon Field-Enhanced Fluorescence Microscopy and Study of Its Optimum Structure
- Continuous Emission-Point Shift in Vertical-Cavity Surface-Emitting Laser Controlled by Optical Feedback
- Grating Substrates Fabricated by Nanoimprint Lithography for Fluorescence Microscopy
- Gigabits-per-Second Signal Transmission from Single-Mode Vertical-Cavity Surface-Emitting Laser via Thin-Film Waveguide for Wavelength-Division-Multiplexing Optical Interconnect Board
- Vertically Y-Branched Mode Splitter/Combiner for Intraboard Chip-to-Chip Optical Interconnection with Wavelength-Division Multiplexing
- Browning of bismuth borate glass by heat treatment under vacuum
- Origin of Intrinsic Second-Harmonic Generation in Crystallized GeO2–SiO2 Glass Films
- Integrated-Optic Add/Drop Multiplexing of Free-Space Waves for Intra-Board Chip-to-Chip Optical Interconnects