Deformation Mechanisms of Bilayer Structures for Reducing Imprinting Force

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In the 1970s, the concept of transferring microscale patterns onto thin films by an imprinting method was discovered by Fujimori, which was different from conventional ones. Until 1995, hot embossing nanoimprint lithography, proposed by Chou, was aimed to transfer nanoscale patterns onto polymeric materials at elevated temperatures. This can be categorized as one of the direct imprinting processes. However, transferring nanoscale patterns onto metals by direct imprinting processes may require a large force in order to result in plastic deformation. In this study, we demonstrate a direct imprinting process applied to the aluminum thin film deposited on a bulk poly(methl methacrylate) (PMMA) instead of on a silicon substrate for the purpose of overcoming this drawback. Indentation was first utilized to determine the mechanical properties of these two types of bilayer structure. Comparing the results of indentation experiments, a difference in hardness of the bilayer structures was detected. In addition, scanning electron microscopy (SEM) was carried out to examine the cross sections of indentation results and two types of deformation mechanism were clearly found. By controlling the imprinting parameters, we focus on the relationship between imprinting force and formation height. After imprinting, atomic force microscopy (AFM) was used to measure the transferred pattern. For about the same formation height, the imprinting force of Al/Si is about twice that of Al/PMMA. The proposed process may be applied to a novel subwavelength metal grating-type polarizer as its optical characteristics are within the acceptable allowance.
2009-06-25

Deformation Mechanisms of Bilayer Structures for Reducing Imprinting Force

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