Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition

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概要

• 論文の詳細を見る

• AlxTi1-xOy (ATO) films were deposited by plasma enhanced atomic layer deposition (PEALD). In the deposition, it was possible to tailor the refractive index and the thickness of films by adjusting the number of cycles used for Al2O3 and TiO2 sublayers. Because optical thickness can be controlled, ATO films will be applicable to optical filters, high reflectivity coating layers and antireflection coating layers.

• 2008-08-25

著者

• Lim Jung

  MIT Device Team, IT-Convergence and Components Laboratory, Electronics and Telecommunications Research Institute, 161 Gajeong-dong, Yuseong-gu, Daejeon 305-350, Korea

• Yun Sun

  MIT Device Team, IT-Convergence and Components Laboratory, Electronics and Telecommunications Research Institute, 161 Gajeong-dong, Yuseong-gu, Daejeon 305-350, Korea

• Kim Hyun

  MIT Device Team, IT-Convergence and Components Laboratory, Electronics and Telecommunications Research Institute, 161 Gajeong-dong, Yuseong-gu, Daejeon 305-350, Korea

関連論文

• Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition
• Vanadium Dioxide and Vanadium Sesquioxide Thin Films Fabricated on (0001) or ($10\bar{1}0$)Al2O3 by Reactive RF-Magnetron Sputter Deposition and Subsequent Annealing Processes

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