Study on Physical Properties of Organic Resist Spacers on Color Filters
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概要
- 論文の詳細を見る
Nano-particle photo spacers with superior physical characteristics have been fabricated into the defined patterns by lithographic processes in color filter manufacture processing. Cylinder-like photo spacers with several heights on the surface of subpixel cells in the defined patterns can be achieved by modulating process parameters. The dimension, height and shape of photo spacers are consistent with the designed pattern size in the mask and promise the reliable stability of photo-spacer materials. That the elastic recovery ratio of the defined pattern photo spacers is initially increased and then decreased with the increase of the applied loading is due to the intrinsic property of photo spacers in polymeric materials.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-06-25
著者
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Chen Mi
Department Of Materials Science And Engineering National Chiao-tung University
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Kawai Tomoji
Nanoscience And Nanotechnology Center The Institute Of Scientific And Industrial Research Osaka Univ
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Koo Horng-Show
Department of Optoelectronic System Engineering, Ming-Hsin University of Science and Technology, Hsinchu 301, Taiwan, R.O.C.
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Chen Mi
Department of Materials Science and Engineering, Minghsin University of Science and Technology, Hsinfong, Hsinchu 304, Taiwan, R.O.C.
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Kang Chung-Hei
Nanoscience and Nanotechnology Center, The Institute of Scientific Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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