Preparation of MgO Films by Atmospheric Metal–Organic Chemical Vapor Deposition as a Protective Layer in AC Plasma Display Panels

概要

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MgO thin films were fabricated by atmospheric metal–organic chemical vapor deposition as a protective layer of AC plasma display panels. The deposition conditions and the discharge properties of the films were evaluated. Among four Mg precursors tested, Mg(C11H19O2)2 [Mg(DPM)2] was the most suitable source material in film growth properties and discharge characteristics. The deposition rate increased with increasing vaporizing temperature and substrate temperature, and the maximum deposition rate reached 3.3 nm/s (5.1 min/μm). The films had (200) main orientations, and highly crystalline square-pyramid structures were observed in high deposition-rate films. Under the high-rate deposition condition, the firing voltage and the discharge delay of the film were comparable to those of conventional vacuum-evaporated MgO film. The discharge delay was shorter when the crystal size was larger, the work function was smaller, and the concentrations of impurities were lower.
2008-03-25