Smooth and Narrow Nanopillars Fabricated by Ion-Beam-Induced Deposition under Charging Conditions
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概要
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We investigate the formation of the irregular sidewall and halo of pillars grown by ion-beam-induced deposition (IBID) by growing platinum nanopillars on an insulating Si3N4 membrane and on a semiconducting Si wafer with a thin Si3N4 top layer. As compared with the pillars grown in a conductive environment, the pillars grown on an insulating membrane are smoother, higher and thinner but have the same volume. Furthermore, they are accompanied by smaller halos. These differences suggest a distinct charging effect in IBID pillar growth. This charging effect is attributed to the secondary electron emission and possibly the aggregation of precursor gas molecules.
- 2008-10-25
著者
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Chen Ping
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg1, 2628 CJ, Delft, The Netherlands
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Chen Ping
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ, Delft, The Netherlands
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Salemink Huub
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg1, 2628 CJ, Delft, The Netherlands
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Alkemade Paul
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg1, 2628 CJ, Delft, The Netherlands
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Salemink Huub
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ, Delft, The Netherlands
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Alkemade Paul
Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ, Delft, The Netherlands
関連論文
- Smooth and Narrow Nanopillars Fabricated by Ion-Beam-Induced Deposition under Charging Conditions
- The Complex Mechanisms of Ion-Beam-Induced Deposition