Low-Energy Electron Beam Direct Writing Equipment
スポンサーリンク
概要
- 論文の詳細を見る
We proposed an electron beam direct writing (EBDW) system capable of high throughput and maskless operation based on a novel concept of using both low-energy electron beam (EB) and character projection (CP) system. We fabricated an EB optical column of low-energy EBDW equipment and obtained a resist pattern. We also investigated the beam blur and line width roughness (LWR) of lines and spaces (L/S) formed on a resist to change various EB current densities and convergence half angles. The obtained results show that a Coulomb interaction effect markedly affects the beam blur in our EB optical column. Thus, we reduce the number of sources caused by LWR and developed photoresists to obtain small LWR L/S patterns for achieving a high throughput.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-09-30
著者
-
Fuse Takashi
e-BEAM Corporation, Konan Park Bldg., 2-12-26 Konan, Minato-ku, Tokyo 108-0075, Japan
-
Ando Atsushi
e-BEAM Corporation, Konan Park Bldg., 2-12-26 Konan, Minato-ku, Tokyo 108-0075, Japan
-
Kotsugi Tadashi
e-BEAM Corporation, Konan Park Bldg., 2-12-26 Konan, Minato-ku, Tokyo 108-0075, Japan
-
Kinoshita Hidetoshi
e-BEAM Corporation, Konan Park Bldg., 2-12-26 Konan, Minato-ku, Tokyo 108-0075, Japan
-
Sugihara Kazuyoshi
e-BEAM Corporation, Konan Park Bldg., 2-12-26 Konan, Minato-ku, Tokyo 108-0075, Japan