Oblique Ion Nano-Texturing Technology for Longitudinal Recording Media

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概要

• 論文の詳細を見る

• We propose a novel texturing technology using off-normal ion beam etching for longitudinal recording glass media. The structure spontaneously forms for a comparatively short time without a template and can uniformly cover the whole surface. It is possible to precisely control the width by the beam condition. The ripple structure also induces Co $c$-axis alignment to the same direction and improves read and write (R/W) properties and thermal stability more effectively than the current mechanical texture.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2007-08-15

著者

• Okamoto Iwao

  Yamagata Fujitsu Limited, Higashine, Yamagata 999-3701, Japan

• Sato Kenji

  Yamagata Fujitsu Limited, Higashine, Yamagata 999-3701, Japan

• Kitamoto Yoshito

  Yamagata Fujitsu Limited, Higashine, Yamagata 999-3701, Japan

• Ishida Shoji

  Yamagata Fujitsu Limited, Higashine, Yamagata 999-3701, Japan

関連論文

• Oblique Ion Nano-Texturing Technology for Longitudinal Recording Media

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