Deterministic Nanometer-Sized Lead Wiring by Atomic Force Microscopy Lithography

概要

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We have demonstrated the deterministic wiring of conductive, nanometer-sized Al leads using atomic force microscopy lithography. Conductive Al leads have been fabricated, with a width that can be controlled to be between approximately 65–200 nm and a width-dependent resistance of approximately 1000–3000 $\Omega$. Using this method, we demonstrate the wiring of such Al leads between large electrode pads and a single self-assembled nanostructure at an arbitrary position on a substrate surface. This method may lead to the incorporation of such nanostructures into semiconductor devices.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2007-06-15